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Journal of Engineering and Applied Sciences
Volume 6 Issue 3, 2011
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Journal of Engineering and Applied Sciences
Year:
2011
| Volume: 6 | Issue: 3 | Page No.: 210-215
DOI:
10.3923/jeasci.2011.210.215
Analytical Model for the High Performance Si Channel N-MOS Process
M. Sreedevi
and
P. Jenopaul
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